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ETD-650M型磁控濺射儀

是我公司研制開發(fā)的一款經(jīng)濟(jì)實(shí)用的袖珍型高真空磁控濺射設(shè)備，更適合各科研及教育機(jī)構(gòu)實(shí)驗(yàn)室的中試驗(yàn)需求。系統(tǒng)主要由濺射真空室、永磁磁控濺射靶（強(qiáng)/弱磁靶）、光纖旋轉(zhuǎn)臺（定制）、直流電源、工作氣路、抽氣系統(tǒng)、循環(huán)水系統(tǒng)、膜厚監(jiān)測系統(tǒng)、真空測量、電控系統(tǒng)及安裝機(jī)臺等部分組成。

真空系統(tǒng)：渦輪分子泵，抽速為300L/s 前級機(jī)械泵：抽速為4L/s，帶防返油電磁閥及油污過濾器 真空測量：采用復(fù)合真空計(jì)監(jiān)測真空

ETD-650M magnetron sputtering instrument

It is an economical and practical pocket magnetron sputtering equipment developed by our company， which is more suitable for the needs of laboratories in various scientific research and educational institutions. The system is mainly composed of sputtering vacuum chamber， permanent magnet magnetron sputtering target (strong / weak magnetic target)， fiber optic rotary table (custom)， DC power supply， working gas circuit， pumping system， circulating water system， film thickness monitoring system， vacuum measurement， electronic control system and installation machine and so on.

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