粉體行業在線展覽
粉體行業在線展覽
直接聯系
German First-Nano System 德國韋氏納米
德國
面議
756
真空回流焊：
| Process environment | nitrogen， inert gas， formic acid， forming gas |
| Maximum temperature | 450°C |
| Heating area | 420 x 420 mm |
| Heating plate | removable: graphite， aluminum， etc. |
| Clearance above heating plate | 60 mm |
| Heat up / cool down ramp | 250°C/min |
| Control deviation | +/- 0.5°C |
| Heating elements | 16x infrared heating lamps in two crossed rows |
| Heating control | individual/adjustable on every heating lamp |
| Cooling of heating plate | nitrogen flow |
| Temperature measurement | up to 4x thermocouples K-Type freely positional |
| Pressure measurement | full range over two gauges |
| Maximum vacuum | 1x10-2 mbar (5x10-6 mbar with turbo pump) |
| Formic acid bubbler | 40 ml container in front panel with auto refill |
| Cooling of chamber body | water/ethylene glycol mixture |
| Lid viewing port | 80 mm with shutter |
| Display | 7" LCD with touch screen |
| PC Software | process logging， recipe transfer， etc. |
| User interface | remote control over relay I/Os |
| Dimensions | see layout |
| Weight | 280 kg |
| Power supply | 3 phase， country specific |
**客戶：
應用：
在真空和惰性氣體中加熱、散熱器上的功率半導體、倒裝芯片回流焊、凸點熔化、高強度LED連接、密封封裝密封、光伏電池組件、模具連接、印刷銅膜燒結、混合電路組件、扁平封裝封裝、微機電系統和光電器件封裝，汽車傳感器、高能電池等。
XRD-晶向定位
CVD 真空化學氣相沉積設備
等離子體增強化學氣相沉積系統CVD
自動劃片機
BTF-1200C-RTP-CVD
FM-W-PDS
Gasboard-2060
Pentagon Qlll
等離子化學氣相沉積系統-PECVD
定制-電漿輔助化學氣相沉積系統-詳情15345079037
