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PVD Products’ provides a wide variety of custom physical vapor deposition systems.
Shown here is a dual chamber system including PLD and Magnetron sputtering connected via a dual wafer loadlock. PVD can provide combination systems like this or completely integrated custom systems specific to the customer requirements.
三腔室設計: PLD腔體+Sputter磁控濺射腔體+Load-lock樣品傳輸腔體
3 UHV Mags
3 x 15 cc ebeam
RHEED
Ellipsometer
100-mm wafers
850°C
RF Bias
<5 x 10-9Torr
XRD-晶向定位
CVD 真空化學氣相沉積設備
等離子體增強化學氣相沉積系統CVD
自動劃片機
BTF-1200C-RTP-CVD
FM-W-PDS
Gasboard-2060
Pentagon Qlll
等離子化學氣相沉積系統-PECVD
定制-電漿輔助化學氣相沉積系統-詳情15345079037